Diffusion studies of Cu in Si and low-k dielectric materials

K. Prasad, X. L. Yuan, C. M. Tan, D. H. Zhang, C. Y. Li, S. R. Wang, S. Y. J. Yuan, J. L. Xie, D. Gui, and P. D. Foo. “Diffusion studies of Cu in Si and low-k dielectric materials,” in Materials Research Society Spring Meeting, 2002.

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