Improvement of Ta diffusion barrier by NH3 plasma pre-treatment

Z. L. Yuan, C. Y. Lia, D. H. Zhang, K. Prasad, C. M. Tan, Y. J. Yuan, P. W. Lu, R. Kumar, and P. D. Foo. “Improvement of Ta diffusion barrier by NH3 plasma pre-treatment,” in Int. Semiconductor Technology Conf., 2002.

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